The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 07, 2006
Filed:
Oct. 20, 2003
Xie Shao, Rolla, MO (US);
Robert Cox, St. James, MO (US);
Shreeram V. Deshpande, Rolla, MO (US);
Tony D. Flaim, St. James, MO (US);
Rama Puligadda, Rolla, MO (US);
Xie Shao, Rolla, MO (US);
Robert Cox, St. James, MO (US);
Shreeram V. Deshpande, Rolla, MO (US);
Tony D. Flaim, St. James, MO (US);
Rama Puligadda, Rolla, MO (US);
Brewer Science Inc., Rolla, MO (US);
Abstract
An improved light attenuating compound for use in the production of microdevices is provided. Broadly, the light attenuating compound is non-aromatic and can be directly incorporated (either physically or chemically) into photolithographic compositions such as bottom anti-reflective coatings (BARC) and contact or via hole fill materials. The preferred non-aromatic compounds of the invention are conjugated aliphatic and alicyclic compounds which greatly enhance the plasma etch rate of the composition. Furthermore, the light attenuating compounds are useful for absorbing light at shorter wavelengths. In one embodiment, the inventive compounds can be polymerized so as to serve as both the polymer binder of the composition as well as the light absorbing constituent.