The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 31, 2006
Filed:
Jun. 28, 2004
Andrew D. Bailey, Iii, Pleasanton, CA (US);
Shrikant P. Lohokare, Fremont, CA (US);
Yunsang Kim, San Jose, CA (US);
Simon Mcclatchie, Fremont, CA (US);
Andrew D. Bailey, III, Pleasanton, CA (US);
Shrikant P. Lohokare, Fremont, CA (US);
Yunsang Kim, San Jose, CA (US);
Simon McClatchie, Fremont, CA (US);
LAM Research Corporation, Fremont, CA (US);
Abstract
A method of cleaning a substrate includes receiving a substrate and applying a stress-free cleaning process to the top surface of the substrate. The substrate includes a top surface that is substantially free of device dependent planarity nonuniformities and device independent planarity nonuniformities. The top surface also includes a first material and a device structure formed in the first material, the device structure being formed from a second material. The device structure has a device surface exposed. The device surface has a first surface roughness. A system for stress-free cleaning a substrate is also described.