The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 2006
Filed:
Jul. 12, 2004
Bernardus Antonius Johannes Luttikhuis, Nuenen, NL;
Petrus Rutgerus Bartray, Ysselsteyn, NL;
Johannes Henricus Wilhelmus Jacobs, Eindhoven, NL;
Thijs Harink, Eindhoven, NL;
Paulus Martinus Maria Liebregts, Veldhoven, NL;
Bernardus Antonius Johannes Luttikhuis, Nuenen, NL;
Petrus Rutgerus Bartray, Ysselsteyn, NL;
Johannes Henricus Wilhelmus Jacobs, Eindhoven, NL;
Thijs Harink, Eindhoven, NL;
Paulus Martinus Maria Liebregts, Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus is disclosed. The apparatus includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam. A projection system is configured to project the patterned radiation beam onto a target portion of a substrate. A first vacuum environment contains the projection system, a second vacuum environment contains the patterning device support, and a separator separates the first and second vacuum environments. The separator includes an aperture for passing the projection beam from the first vacuum environment towards the patterning device and/or vice-versa. The patterning device forms at least part of a seal for substantially sealing the aperture of the separator.