The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 2006
Filed:
Aug. 30, 2005
Haruo Yoda, Nishitama, JP;
Yasunari Souda, Kawasaki, JP;
Hiroya Ohta, Kodaira, JP;
Yoshikiyo Yui, Utsunomiya, JP;
Shinichi Hashimoto, Tokyo, JP;
Haruo Yoda, Nishitama, JP;
Yasunari Souda, Kawasaki, JP;
Hiroya Ohta, Kodaira, JP;
Yoshikiyo Yui, Utsunomiya, JP;
Shinichi Hashimoto, Tokyo, JP;
Abstract
A multi-electron beam exposure method and apparatus, wherein electron beams are applied to a sample surface mounted on a traveling sample stage to perform repeated exposure of chip patterns. An exposure region of the sample surface is partitioned into multiple stripe regions having a width in an x-axis direction, and each of the multiple stripe regions is further partitioned into multiple main fields having a width in a y-axis direction. At least one of the widths of the main fields in the x- and y-axis directions is set to a value, and exposure pattern data for one chip based on the partitioned main fields is stored as a unit. The stored exposure pattern data is readout a number of times corresponding to the number of chips repeatedly, and each electron beam provides repeated exposure of same regions of the chips.