The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 2006
Filed:
Feb. 09, 2004
Yuji Harada, Niigata-ken, JP;
Jun Hatakeyama, Niigata-ken, JP;
Yoshio Kawai, Niigata-ken, JP;
Masaru Sasago, Hirakata, JP;
Masayuki Endo, Kishiwada, JP;
Shinji Kishimura, Itami, JP;
Kazuhiko Maeda, Tokyo, JP;
Haruhiko Komoriya, Kawagoe, JP;
Satoru Miyazawa, Kawagoe, JP;
Yuji Harada, Niigata-ken, JP;
Jun Hatakeyama, Niigata-ken, JP;
Yoshio Kawai, Niigata-ken, JP;
Masaru Sasago, Hirakata, JP;
Masayuki Endo, Kishiwada, JP;
Shinji Kishimura, Itami, JP;
Kazuhiko Maeda, Tokyo, JP;
Haruhiko Komoriya, Kawagoe, JP;
Satoru Miyazawa, Kawagoe, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Matsushita Electric Industrial Co., Ltd., Kadoma, JP;
Central Glass Co., Ltd., Ube, JP;
Abstract
A sulfonate compound having formula (1) is novel wherein Rto Rare H, F or Calkyl or fluoroalkyl, at least one of Rto Rcontains F. A polymer comprising units derived from the sulfonate compound is used as a base resin to formulate a resist composition which is sensitive to high-energy radiation, maintains high transparency at a wavelength of up to 200 nm, and has improved alkali dissolution contrast and plasma etching resistance