The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 17, 2006
Filed:
Mar. 11, 2004
Pieter Johannes Marius Van Groos, Geldrop, NL;
Pieter Renaat Maria Hennus, Peer, BE;
Jan Frederik Hoogkamp, Breda, NL;
Albert Jan Hendrik Klomp, Eindhoven, NL;
Johannes Onvlee, 's-Hertogenbosch, NL;
Raimond Visser, Best, NL;
Pieter Johannes Marius Van Groos, Geldrop, NL;
Pieter Renaat Maria Hennus, Peer, BE;
Jan Frederik Hoogkamp, Breda, NL;
Albert Jan Hendrik Klomp, Eindhoven, NL;
Johannes Onvlee, 's-Hertogenbosch, NL;
Raimond Visser, Best, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
The invention relates to a lithographic projection assembly, having at least two load locks for transferring substrates between a first environment and a lower pressure second environment, a substrate handler with a handler chamber within the second environment and a lithographic projection apparatus including a projection chamber. The handler chamber and the projection chamber communicate via a load position for entering a substrate from the handler chanter into the projection chamber and an unload position for removing the substrate from the projection chamber into the handler chamber. The handler chamber also includes pre-processing means for pre-processing of the substrates and transport means for transferring substrates between the load locks and pre-processing means.