The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 10, 2006

Filed:

Apr. 28, 2004
Applicants:

Martinus Hendrikus Antonius Leenders, Rotterdam, NL;

Hendricus Johannes Maria Meijer, Veldhoven, NL;

Engelbertus Antonius Fransiscus Van Der Pasch, Oirschot, NL;

Michael Jozef Mathijs Renkens, Sittard, NL;

Theo Anjes Maria Ruijl, Eindhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01C 3/08 (2006.01); G01B 11/14 (2006.01); G03B 27/54 (2006.01);
U.S. Cl.
CPC ...
Abstract

In a lithographic projection apparatus, a measuring system configured to measure the position of the projection system relative to a reference frame includes sensors rigidly mounted in relation to counterpart sensors of a measuring system measuring the substrate table position. An angular encoder which sends light from a target down two optical paths having opposite sensitivities to tilt is used to measure rotation of the projection system about its optical axis.


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