The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 03, 2006

Filed:

Sep. 02, 2004
Applicant:

Paul J. Rudeck, Boise, ID (US);

Inventor:

Paul J. Rudeck, Boise, ID (US);

Assignee:

Micron Technology, Inc., Boise, ID (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/8238 (2006.01);
U.S. Cl.
CPC ...
Abstract

Methods and apparatus utilizing a stepped floating gate structure to facilitate reduced spacing between adjacent cells without significantly impacting parasitic capacitance. The stepped structure results in a reduced surface area of a first floating gate in close proximity to an adjacent floating gate with substantially no reduction in coupling area, thus facilitating a reduction in parasitic capacitance leading to improved gate coupling characteristics. Also, because of the reduced surface area exposed to adjacent floating gates, the floating gates may be formed with reduced spacing, thus further leading to improved gate coupling characteristics.


Find Patent Forward Citations

Rudeck, Paul. (2006). Gate coupling in floating-gate memory cells (U.S. Patent No. 7115458). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7115458

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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