The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 26, 2006
Filed:
Jun. 21, 2005
Kevin O'leary, Lucan, IE;
Francisco Martinez, Raheny, IE;
Marcus Carbery, Artane, IE;
Scientific Systems Research Limited, Dublin, IE;
Abstract
A method of transferring a multi-variate process control model from one RF-powered plasma processing chamber (the reference chamber) to another nominally identical RF-powered plasma processing chamber (the target chamber) comprises first determining a multi-variate process control model on the reference tool based upon sensor data,. Then, a set of sensor data is taken for the reference chamber by running a designed experiment,, and a corresponding set of sensor data is taken for the target chamber using the same designed experiment,. The relationship between the reference and target chambers is determined by comparing the results of the designed experiments and calculating a transform matrix representing differences between the two chambers,. Finally, the process control model is transformed from the reference chamber to the target chamber using the transform matrix thus obtained,