The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 26, 2006
Filed:
Jun. 22, 2004
Tjarko Adriaan Rudolf Van Empel, Eindhoven, NL;
Aschwin Lodewijk Hendricus Johannes Van Meer, Roosendaal, NL;
Koen Jacobus Johannes Maria Zaal, Eindhoven, NL;
Ton Aantjes, Best, NL;
Tjarko Adriaan Rudolf Van Empel, Eindhoven, NL;
Aschwin Lodewijk Hendricus Johannes Van Meer, Roosendaal, NL;
Koen Jacobus Johannes Maria Zaal, Eindhoven, NL;
Ton Aantjes, Best, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation and a substrate holder for supporting a substrate to be placed in a beam path of the beam of radiation. The substrate holder includes a plurality of first protrusions, the distal ends thereof defining a first contact surface for contacting the substrate, and a plurality of second protrusions, the distal ends thereof defining a second contact surface for supporting the substrate. The second protrusions are arranged for preventing sticking of the substrate to the first contact surface during release of a clamping pressure so that (1) the substrate contacts the first and second contact surfaces when the substrate is clamped against the substrate holder, and (2) the substrate is supported by the second contact surface and distanced from the first contact surface when the substrate is not clamped.