The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 26, 2006
Filed:
Sep. 30, 2003
Douglas D. Coolbaugh, Essex Junction, VT (US);
Heidi L. Greer, Essex Junction, VT (US);
Robert M. Rassel, Colchester, VT (US);
Douglas D. Coolbaugh, Essex Junction, VT (US);
Heidi L. Greer, Essex Junction, VT (US);
Robert M. Rassel, Colchester, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A process is disclosed for fabricating precision polysilicon resistors which more precisely control the tolerance of the sheet resistivity of the produced polysilicon resistors. The process generally includes performing an emitter/FET activation rapid thermal anneal (RTA) on a wafer having partially formed polysilicon resistors, followed by steps of depositing a protective dielectric layer on the polysilicon, implanting a dopant through the protective dielectric layer into the polysilicon to define the resistance of the polysilicon resistors, and forming a silicide.