The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 2006
Filed:
Feb. 12, 2004
Pieter Klaas DE Bokx, Eindhoven, NL;
Tjarko Adriaan Rudolf Van Empel, Eindhoven, NL;
Ronald Johannes Hultermans, Utrecht, NL;
Adrianus Cornelius Antonius Jonkers, Moergestel, NL;
Pieter Klaas De Bokx, Eindhoven, NL;
Tjarko Adriaan Rudolf Van Empel, Eindhoven, NL;
Ronald Johannes Hultermans, Utrecht, NL;
Adrianus Cornelius Antonius Jonkers, Moergestel, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic projection apparatus includes a radiation system constructed and arranged to supply a projection beam of radiation, a support structure constructed and arranged to support a patterning structure, the patterning structure constructed and arranged to pattern the projection beam according to a desired pattern, a substrate support constructed and arranged to support a substrate, and a projection system constructed and arranged to project the patterned beam onto a target portion of the substrate. The apparatus further includes a gas flushing system comprising radial gas flow outlets, said gas flushing system being constructed and arranged to generate a radial gas flow through said radial gas flow outlets in an intermediate space defined between said gas flushing system and said substrate, wherein the radial gas flow has a radial velocity directed outwards in said space with a magnitude larger than zero at every location in said space.