The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 2006
Filed:
Feb. 19, 2003
Yoshiaki Mori, Suwa-gun, JP;
Takuya Miyakawa, Okaya, JP;
Mitsuru Sato, Chino, JP;
Shintaro Asuke, Suwa-gun, JP;
Kenichi Takagi, Suwa, JP;
Yoshiaki Mori, Suwa-gun, JP;
Takuya Miyakawa, Okaya, JP;
Mitsuru Sato, Chino, JP;
Shintaro Asuke, Suwa-gun, JP;
Kenichi Takagi, Suwa, JP;
Seiko Epson Corporation, Tokyo, JP;
Abstract
An object is to provide a mask formation method, which can curtail a manufacturing cost. A method of forming a film of predetermined pattern on the front surface of a member to-be-processed is so constructed as to carry out the step (S) of improving the adherence of a pattern material solution to the member to-be-processed, the step (S) of filling up a pattern forming recess provided in a mask on the surface of the member to-be-processed with a pattern material solution, the step (S) of improving the film quality of the pattern film to-be-formed by processing the pattern material solution, the step (S) of removing the pattern material solution having adhered on the mask, the step (S) of drying the pattern material solution, and the step (S) of subjecting the pattern film to annealing processing.