The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2006
Filed:
Sep. 22, 2004
Benoit Barthod, Naves-Parmelan, FR;
Jean-luc Rival, Villaz, FR;
Matthieu Morpain, Pouilley les Vignes, FR;
Benoit Barthod, Naves-Parmelan, FR;
Jean-Luc Rival, Villaz, FR;
Matthieu Morpain, Pouilley les Vignes, FR;
Alcatel, Paris, FR;
Abstract
The EUV radiation source of the invention comprises an irradiation chamber () containing an irradiation zone () into which a stream of radiation-generator material is generated such as a flow of xenon propagating along a direction (II—II) extending transversely relative to an optical axis (I—I). The irradiation zone () is in the proximity of a diaphragm () oriented on the optical axis (I—I) and putting the irradiation chamber () into communication with a transmission chamber (). Power laser beams () strike the stream of radiation-generator material in the irradiation zone () and produce EUV radiation which propagates through the diaphragm () and which is conditioned in the transmission chamber () by elliptical mirrors (). Differential pumps () maintain a pressure Pin the transmission chamber () that is well below the pressure Pin the irradiation chamber (). The low pressure in the transmission chamber () ensures that the EUV radiation is transmitted with little attenuation to a zone of use, without requiring voluminous high speed pumps ().