The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 08, 2006
Filed:
Dec. 17, 2003
Joost Jeroen Ottens, Veldhoven, NL;
Johannes Hubertus Josephina Moors, Helmond, NL;
Peter Theodorus Maria Giesen, The Hague, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Johannes Hubertus Josephina Moors, Helmond, NL;
Peter Theodorus Maria Giesen, The Hague, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes an illumination system for providing a beam of radiation, an article support for supporting a flat article to be placed in a beam path of the beam of radiation on the article support, an electrostatic clamp for clamping the article against the article support by an electrostatic field during projection, and a recessed backfill gas feed arranged in the article support for feeding backfill gas to a backside of the article when supported by the article support. According to one aspect of the invention, the recessed backfill gas feed includes a shielding layer for shielding the backfill gas in the recessed backfill gas feed from the electrostatic field.