The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 08, 2006
Filed:
Apr. 20, 2004
Adlai H. Smith, Escondido, CA (US);
Robert O. Hunter, Jr., San Diego, CA (US);
Bruce Mcarthur, San Diego, CA (US);
Adlai H. Smith, Escondido, CA (US);
Robert O. Hunter, Jr., San Diego, CA (US);
Bruce McArthur, San Diego, CA (US);
Litel Instruments, San Diego, CA (US);
Abstract
An in-situ apparatus for high resolution imaging in lithographic steppers and scanners (machines) is described. It comprises a multiple field in-situ imaging objective that images the source directly onto the machine reticle or objective plane. The image on the wafer side of the machine is then recorded electronically or in photo resist. Alternative embodiments create source images at locations before or beyond the wafer plane that can be more conveniently recorded with sensors embedded in the wafer stage chuck.