The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 2006
Filed:
Mar. 11, 2004
Akira Fukuda, Fujisawa, JP;
Akio Shibata, Fujisawa, JP;
Hirokuni Hiyama, Fujisawa, JP;
Katsunori Ichiki, Fujisawa, JP;
Kazuo Yamauchi, Fujisawa, JP;
Seiji Samukawa, Sendai, JP;
Akira Fukuda, Fujisawa, JP;
Akio Shibata, Fujisawa, JP;
Hirokuni Hiyama, Fujisawa, JP;
Katsunori Ichiki, Fujisawa, JP;
Kazuo Yamauchi, Fujisawa, JP;
Seiji Samukawa, Sendai, JP;
Ebara Corporation, Tokyo, JP;
Tohoku University, Sendai, JP;
Abstract
A beam source has a plasma generating chamber, an antenna for generating plasma in the plasma generating chamber, a first electrode disposed in the plasma generating chamber, and a second electrode disposed in the plasma generating chamber. Both of the antenna and the second electrode face the first electrode. The beam source also includes a power supply for applying a voltage between the first electrode and the second electrode to extract particles from the plasma generated by the antenna. The beam source applies various kinds of beams having a large diameter, such as a positive ion beam, a negative ion beam, and a neutral particle beam, uniformly to a workpiece.