The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 11, 2006
Filed:
Nov. 17, 2003
Daniel N Galburt, Wilton, CT (US);
Mark Williams, Amherst, NH (US);
Daniel N Galburt, Wilton, CT (US);
Mark Williams, Amherst, NH (US);
ASML Holding N.V., Veldhoven, NL;
Abstract
An apparatus for stabilizing a scanning system during lithographic processing comprises a baseframe, a reaction mass, and a pair of flexures connecting the reaction mass to the baseframe. The apparatus also comprises a second reaction mass and a second pair of flexures, placed in parallel to the first to form a split reaction mass system. The apparatus is configured such that, upon acceleration of a stage movably coupled to the reaction masses, a resulting load is split substantially evenly between the first and second reaction masses. Also upon acceleration of the stage, the first reaction mass rotates in the opposite direction of the second reaction mass, resulting in a net moment reaction on the baseframe of approximately zero.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile