The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 2006
Filed:
Oct. 21, 2002
Robert J. Contolini, Lake Oswego, OR (US);
Andrew J. Mccutcheon, West Linn, OR (US);
Steven T. Mayer, Lake Oswego, OR (US);
Robert J. Contolini, Lake Oswego, OR (US);
Andrew J. McCutcheon, West Linn, OR (US);
Steven T. Mayer, Lake Oswego, OR (US);
Novellus Systems, Inc., San Jose, CA (US);
Abstract
In an electrochemical reactor used for electrochemical treatment of a substrate, for example, for electroplating or electropolishing the substrate, one or more of the surface area of a field-shaping shield, the shield's distance between the anode and cathode, and the shield's angular orientation is varied during electrochemical treatment to screen the applied field and to compensate for potential drop along the radius of a wafer. The shield establishes an inverse potential drop in the electrolytic fluid to overcome the resistance of a thin film of conductive metal on the wafer.