The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 2006
Filed:
Aug. 01, 2002
Sidlgata V Sreenivasan, Austin, TX (US);
Michael P. C. Watts, Austin, TX (US);
Byung Jin Choi, Round Rock, TX (US);
Ronald D. Voisin, Fremont, CA (US);
Norman E. Schumaker, Austin, TX (US);
Sidlgata V Sreenivasan, Austin, TX (US);
Michael P. C. Watts, Austin, TX (US);
Byung Jin Choi, Round Rock, TX (US);
Ronald D. Voisin, Fremont, CA (US);
Norman E. Schumaker, Austin, TX (US);
Molecular Imprints, Inc., Austin, TX (US);
Abstract
Described are systems for patterning a substrate by imprint lithography. Imprint lithography systems include an imprint head configured to hold a template in a spaced relation to a substrate. The imprint lithography system is configured to dispense an activating light curable liquid onto a substrate or template. The system includes a light source that applies activating light to cure the activating light curable liquid. Multiple optical imaging devices are used to align the template with the substrate.