The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 27, 2006
Filed:
Apr. 23, 2004
Ingrid Minnaert-janssen, Veldhoven, NL;
Johannes Jacobus Matheus Baselmans, Oirschot, NL;
Frits Jurgen Van Hout, Retie, BE;
Peter Van Oorschot, Eindhoven, NL;
Christian Wagner, Eersel, NL;
Adriaan Roelof Van Zwol, Eindhoven, NL;
Roderik Willem Van ES, Geldrop, NL;
Petrus Augustinus Marie Van Der Wielen, Stiphout, NL;
Hubrecht Lodewijk Van Ginneken, Utrecht, NL;
Ingrid Minnaert-Janssen, Veldhoven, NL;
Johannes Jacobus Matheus Baselmans, Oirschot, NL;
Frits Jurgen Van Hout, Retie, BE;
Peter Van Oorschot, Eindhoven, NL;
Christian Wagner, Eersel, NL;
Adriaan Roelof Van Zwol, Eindhoven, NL;
Roderik Willem Van Es, Geldrop, NL;
Petrus Augustinus Marie Van Der Wielen, Stiphout, NL;
Hubrecht Lodewijk Van Ginneken, Utrecht, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
To reduce and prevent local field anomalies created localized thinning of the coating of optical elements in the apparatus. The projection system is flood exposed to an intense beam of radiation for a substantial period of time. As the rate of thinning of the coating decreases with time, a uniform coating results.