The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 27, 2006
Filed:
Dec. 20, 2002
James M. Powers, Aloha, OR (US);
James M. Powers, Aloha, OR (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
Pellicles separated by a distance sufficient to allow a purge gas help repair damage to at least one of the pellicles caused by exposure to an incident radiation and allowing at least a minimum amount of radiation to reach a semiconductor wafer sufficient to perform a desired photolythography process. Moreover, the two pellicles separated by a sufficient distance such that a dispersed purge gas dispersed between the pellicles will not absorb more than an amount of energy from the incident radiation so as to prevent a desired amount of the radiation to reach a semiconductor wafer located a certain distance away from the pellicles.