The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 27, 2006

Filed:

Jul. 30, 2003
Applicants:

Haruo Yoda, Nishitama, JP;

Yasunari Souda, Kawasaki, JP;

Hiroya Ohta, Kodaira, JP;

Yoshikiyo Yui, Utsunomiya, JP;

Shinichi Hashimoto, Tokyo, JP;

Inventors:

Haruo Yoda, Nishitama, JP;

Yasunari Souda, Kawasaki, JP;

Hiroya Ohta, Kodaira, JP;

Yoshikiyo Yui, Utsunomiya, JP;

Shinichi Hashimoto, Tokyo, JP;

Assignees:

Hitachi, Ltd., Tokyo, JP;

Canon Kabushiki Kaisha, Tokyo, JP;

Advantest Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

The dimension of the main field as a unit region for exposure is set to an integral submultiple of the arrangement pitch of the LSI to be exposed, by the control computer, and the exposure data stored in the form associated with electron beams from a data generation circuitis limited to one-chip data alone in units of a stripe. This data is repeatedly read out to write the stripe. Further, a storage circuitis provided to store the exposure data by means of a double buffer memory unit for each electron beam. While LSI is written according to one of the buffers, the next exposure stripe data is prepared on the other buffer, thereby bringing about a substantial reduction in the required speed of the exposure data generation circuit.


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