The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 2006
Filed:
Nov. 10, 2004
Levinus Pieter Bakker, Helmond, NL;
Vadim Yevgenyevich Banine, Helmond, NL;
Vladimir Vitalevitch Ivanov, Moscow, RU;
Konstantin Nikolaevitch Koshelev, Troitsk, RU;
Vladimir Mihailovitch Krivtsun, Troitsk, RU;
Levinus Pieter Bakker, Helmond, NL;
Vadim Yevgenyevich Banine, Helmond, NL;
Vladimir Vitalevitch Ivanov, Moscow, RU;
Konstantin Nikolaevitch Koshelev, Troitsk, RU;
Vladimir Mihailovitch Krivtsun, Troitsk, RU;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic projection apparatus is provided. The apparatus includes a radiation system for providing a beam of radiation, and a support for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam of radiation onto a target portion of the substrate, and a particle supply unit for supplying getter particles into the beam of radiation in order to act as a getter for contamination particles in the beam of radiation. The getter particles have a diameter of at least about 1 nm.