The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 13, 2006

Filed:

Mar. 14, 2001
Applicants:

Volker Drexel, Königsbronn, DE;

Johannes Bihr, Aalen, DE;

Gerd Benner, Aalen, DE;

Stephan Kujawa, Berlin, DE;

Inventors:

Volker Drexel, Königsbronn, DE;

Johannes Bihr, Aalen, DE;

Gerd Benner, Aalen, DE;

Stephan Kujawa, Berlin, DE;

Assignee:

Carl Zeiss NTS GmbH, Oberkochen, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
Abstract

A detector system for a particle beam apparatus, in particular for a scanning electron microscope, has a target structure, which in a central region near the optical axis includes an electron-converting material. The target structure also includes either a non-converting material in a region remote from the optical axis or the region remote from the optical axis is offset in the direction of the optical axis with respect to the region near the optical axis that includes the electron-converting material. The detector system makes possible separate detection of only back-scattered electrons or only secondary electrons.


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