The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 13, 2006

Filed:

Jan. 20, 2003
Applicants:

Kazuhiko Sugiyama, Minato-ku, JP;

Nobukazu Ikeda, Nishi-ku, JP;

Kouji Nishino, Nishi-ku, JP;

Ryosuke Dohi, Nishi-ku, JP;

Toyomi Uenoyama, Nishi-ku, JP;

Inventors:

Kazuhiko Sugiyama, Minato-ku, JP;

Nobukazu Ikeda, Nishi-ku, JP;

Kouji Nishino, Nishi-ku, JP;

Ryosuke Dohi, Nishi-ku, JP;

Toyomi Uenoyama, Nishi-ku, JP;

Assignees:

Fujikin Incorporated, Osaka, JP;

Tokyo Electron Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B65B 1/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for supplying a specified quantity Q of processing gas while dividing at a desired flow rate ratio Q/Qaccurately and quickly from a gas supply facility equipped with a flow controller into a chamber. When a specified quantity Q of gas is supplied while being divided at a desired flow rate ratio Q/Qfrom a gas supply facility equipped with a flow controller into a reduced pressure chamber C through a plurality of branch supply lines and shower plates fixed to the ends thereof, pressure type division quantity controllers FVand FVare provided in the plurality of branch supply lines GLand GL. Opening control of both division quantity controllers FVand FVis started by an initial flow rate set signal from a division quantity control board FRC for fully opening the control valve CV of the pressure type division quantity controller having a higher flow rate and pressures P' and P″ on the downstream side of the control valve CV are regulated thus supplying a total quantity Q=Q+Qof gas while dividing into the chamber C through orifice holes () made in shower plates () at desired division quantities Qand Qrepresented by formulas Q=CP′ and Q=CP″ (where, Cand Care constants dependent on the cross-sectional area of the orifice hole or the gas temperature on the upstream side thereof).


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