The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 06, 2006
Filed:
Nov. 25, 2003
Dingjun Wu, Macungie, PA (US);
Bing Ji, Allentown, PA (US);
Stephen Andrew Motika, Kutztown, PA (US);
Eugene Joseph Karwacki, Jr., Orefield, PA (US);
Dingjun Wu, Macungie, PA (US);
Bing Ji, Allentown, PA (US);
Stephen Andrew Motika, Kutztown, PA (US);
Eugene Joseph Karwacki, Jr., Orefield, PA (US);
Air Products and Chemicals, Inc., Allentown, PA (US);
Abstract
A method for dry etching and chamber cleaning high dielectric constant materials is disclosed herein. In one aspect of the present invention, there is provided a process for cleaning a substance comprising a dielectric constant greater than the dielectric constant of silicon dioxide from at least a portion of a surface of a reactor comprising: introducing a first gas mixture comprising a boron-containing reactive agent into the reactor wherein the first gas mixture reacts with the substance contained therein to provide a volatile product and a boron-containing by-product; introducing a second gas mixture comprising a fluorine-containing reactive agent into the reactor wherein the second gas mixture reacts with the boron-containing by-product contained therein to form the volatile product; and removing the volatile product from the reactor.