The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 16, 2006
Filed:
Jul. 29, 2005
Applicants:
Jason D. Hintersteiner, Bethel, CT (US);
Karel Van Der Mast, Helmond, NL;
Arno Jan Bleeker, Westerhoven, NL;
Inventors:
Jason D. Hintersteiner, Bethel, CT (US);
Karel van der Mast, Helmond, NL;
Arno Jan Bleeker, Westerhoven, NL;
Assignee:
ASML Holding N.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
G02B 26/00 (2006.01); G09G 5/02 (2006.01); G03B 27/42 (2006.01); G01N 21/86 (2006.01); G03C 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A system and method are used for pulse to pulse dose control in an illumination system, used, for example, in a lithography or a maskless lithography machine. The system and method can be used to decrease effective laser pulse-to-pulse variability in lithographic lasers, allowing adequate dose control using a minimum number of pulses (e.g. as little as one pulse).