The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 09, 2006
Filed:
Jun. 06, 2003
Chih-hsiang Yao, Taipei, TW;
Chin-chiu Hsia, Taipei, TW;
Wen-kai Wan, Hsinchu, TW;
Abstract
A structure for reducing stress-induced voiding in an interconnect of an integrated circuit, the interconnect having a first portion and at least a second portion narrower than the first portion. The structure comprises at least one interior slot disposed in the first portion in proximity to the intersection of the first portion and the second portion. The present invention also includes methods of making the interconnect and the structure. A conductive interconnect structure comprises a first portion and at least a second portion narrower than the first portion; and a stress reducing structure comprising a transition portion formed at an intersection of the first portion and the second portion.