The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 09, 2006

Filed:

Jul. 18, 2002
Applicants:

Matthias Goldbach, Dresden, DE;

Thomas Hecht, Dresden, DE;

Jörn Lützen, Dresden, DE;

Bernhard Sell, Portland, OR (US);

Inventors:

Matthias Goldbach, Dresden, DE;

Thomas Hecht, Dresden, DE;

Jörn Lützen, Dresden, DE;

Bernhard Sell, Portland, OR (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/20 (2006.01);
U.S. Cl.
CPC ...
Abstract

A structure on a layer surface of the semiconductor wafer has at least one first area region (), which is reflective for electromagnetic radiation, and at least one second, essentially nonreflecting area region (). A light-transmissive insulation layer () and a light-sensitive layer are produced on said layer surface. The electromagnetic radiation is directed onto the light-sensitive layer with an angle Θ of incidence and the structure of the layer surface is imaged with a lateral offset into the light-sensitive layer.


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