The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 09, 2006
Filed:
Nov. 12, 2003
Kouji Fujiyoshi, Tokyo, JP;
Masami Takigawa, Tokyo, JP;
Kouji Fujiyoshi, Tokyo, JP;
Masami Takigawa, Tokyo, JP;
Advantest Corp., Tokyo, JP;
Abstract
An electron beam exposure apparatus for exposing a wafer with an electron beam includes a section for generally controlling a wafer exposing system, a first buffer memory for temporarily storing exposure data, a second buffer memory for temporarily storing the exposure data, a first exposing section for irradiating the wafer with an electron beam based on exposure data output from the first buffer memory, and a first comparing section for comparing exposure data output from the first buffer memory with exposure data output from the second buffer memory and notifying the comparison results to the general control section. The exposure data stored in the first buffer memory and the exposure data stored in the second buffer memory are identical to one another when no error is involved. Further, an exposure apparatus and a pattern error detection method for accurately detecting an error of an exposure pattern formed to a wafer is disclosed.