The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 25, 2006

Filed:

Jul. 21, 2003
Applicants:

Masaki Takakuwa, Tokyo, JP;

Yoshinori Nakayama, Tokyo, JP;

Gen Nakamura, Tokyo, JP;

Inventors:

Masaki Takakuwa, Tokyo, JP;

Yoshinori Nakayama, Tokyo, JP;

Gen Nakamura, Tokyo, JP;

Assignees:

Advantest Corporation, Tokyo, JP;

Hitachi Ltd., Tokyo, JP;

Canon Kabushiki Kaisha, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/304 (2006.01); H01J 37/244 (2006.01); G01R 29/24 (2006.01);
U.S. Cl.
CPC ...
Abstract

An electron beam exposure apparatus for exposing wafer by using an electron beam includes: an electron beam generator for generating the electron beam; a wafer stage for holding the wafer to be exposed; a current detector, provided on the wafer stage, for detecting a current of the electron beam; and a storage unit, provided on the wafer stage, for storing information indicating the current detected by the current detector.


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