The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 25, 2006
Filed:
Mar. 11, 2004
Katsunori Ichiki, Fujisawa, JP;
Akio Shibata, Fujisawa, JP;
Akira Fukuda, Fujisawa, JP;
Hirokuni Hiyama, Fujisawa, JP;
Kazuo Yamauchi, Fujisawa, JP;
Seiji Samukawa, Sendai, JP;
Katsunori Ichiki, Fujisawa, JP;
Akio Shibata, Fujisawa, JP;
Akira Fukuda, Fujisawa, JP;
Hirokuni Hiyama, Fujisawa, JP;
Kazuo Yamauchi, Fujisawa, JP;
Seiji Samukawa, Sendai, JP;
Ebara Corporation, Tokyo, JP;
Tohoku University, Sendai, JP;
Abstract
A beam source has a plasma generating chamber and a gas inlet port for introducing a gas into the plasma generating chamber. The beam source includes a plasma generator for generating positive-negative ion plasma containing positive ions at a density of at least 10ions/cmand negative ions from the gas. The beam source also includes a plasma potential adjustment electrode disposed in the plasma generating chamber and a grid electrode having a plurality of beam extraction holes formed therein. The beam extraction holes have a diameter of at least 0.5 mm. The beam source has a first power supply for applying a voltage of at most 500 V between the plasma potential adjustment electrode and the grid electrode.