The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 2006
Filed:
Apr. 25, 2003
Avishay Guetta, Rehovot, IL;
Haim Feldman, Nof-Ayalon, IL;
Ron Naftali, Shoham, IL;
Doron Shoham, Rehovot, IL;
Avishay Guetta, Rehovot, IL;
Haim Feldman, Nof-Ayalon, IL;
Ron Naftali, Shoham, IL;
Doron Shoham, Rehovot, IL;
Applied Materials, Israel, LTD, Rehovot, IL;
Abstract
A system and method for inspection of a substrate having a first refractive index, the method including the steps of: (i) defining an apodization scheme in response to a characteristic of the layer; (ii) applying an apodizer to apodize a beam of radiation in response to the apodization scheme; (iii) directing the apodized beam of radiation to impinge on the substrate, whereby a plurality of rays are reflected from the substrate; whereas the apodized beam of radiation propagates through an at least partially transparent medium having a third refractive index and an at least partially transparent layer having a second refractive index and is subsequently reflected from the substrate; whereas the second refractive index differs from the first refractive index and from the third refractive index; and (iv) detecting at least some of the plurality of reflected rays.