The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 2006
Filed:
Nov. 27, 2001
Lin Sha, Tsukui-gun, JP;
Shou-qian Shao, Winchester, MA (US);
Yicheng LI, Tsukui-gun, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
The single substrate thermal processing apparatus () includes a process chamber () arranged to accommodate a target substrate (W) and provided with a showerhead () disposed on its ceiling. A support member () is disposed to support the target substrate (W) so as for it to face the showerhead (), when the target substrate (W) is subjected to a semiconductor process. A heating lamp () is disposed below the support member (), for radiating light to heat the target substrate (W). The support member () and heating lamp () are moved up and down together relative to the showerhead () by an elevator mechanism (). The elevator mechanism () sets different distances between the showerhead () and heating lamp (), in accordance with the different process temperatures, thereby causing temperature change of the bottom surface of the showerhead () to fall in a predetermined range.