The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 2006
Filed:
Oct. 31, 2003
Ernst H. A. Granneman, Hilversum, NL;
Vladimir I. Kuznetsov, Ultrecht, NL;
Xavier Pagès, Lovenjoel, BE;
Pascal G. Vermont, Almere, NL;
Ernst H. A. Granneman, Hilversum, NL;
Vladimir I. Kuznetsov, Ultrecht, NL;
Xavier Pagès, Lovenjoel, BE;
Pascal G. Vermont, Almere, NL;
ASM International N.V., Bilthoven, NL;
Abstract
A substrate undergoes a semiconductor fabrication process at different temperatures in a reactor without changing the temperature of the reactor. The substrate is held suspended by flowing gas between two heated surfaces of the reactor. Moving the two heated surfaces in close proximity with the substrate for a particular time duration heats the substrate to a desired temperature. The desired temperature is then maintained by distancing the heated surfaces from the substrate and holding the heated surface at the increased distance to minimize further substrate heating.