The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2006
Filed:
Sep. 23, 2004
Tza-jing Gung, San Jose, CA (US);
Hong S. Yang, Pleasanton, CA (US);
Anantha K. Subramani, San Jose, CA (US);
Maurice E. Ewert, San Jose, CA (US);
Keith A. Miller, Sunnyvale, CA (US);
Vincent E. Burkhart, San Jose, CA (US);
Tza-Jing Gung, San Jose, CA (US);
Hong S. Yang, Pleasanton, CA (US);
Anantha K. Subramani, San Jose, CA (US);
Maurice E. Ewert, San Jose, CA (US);
Keith A. Miller, Sunnyvale, CA (US);
Vincent E. Burkhart, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A dual-position magnetron that is rotated about a central axis in back of a sputtering target, particularly for sputtering an edge of a target of a barrier material onto a wafer and cleaning material redeposited at a center of the target. During target cleaning, wafer bias is reduced. In one embodiment, an arc-shaped magnetron is supported on a pivot arm pivoting on the end of a bracket fixed to the rotary shaft. A spring biases the pivot arm such that the magnetron is urged towards and overlies the target center. Centrifugal force at increased rotation rate overcomes the spring bias and shift the magnetron to an outer position with the long magnetron dimension aligned with the target edge. Mechanical stops prevent excessive movement in either direction. Other mechanisms include linear slides and actuators.