The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 21, 2006
Filed:
Jun. 09, 2004
Applicants:
Wataru Suzuki, Hitachinaka, JP;
Eiichi Hazaki, Hitachinaka, JP;
Inventors:
Wataru Suzuki, Hitachinaka, JP;
Eiichi Hazaki, Hitachinaka, JP;
Assignee:
Hitachi High-Technologies Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/20 (2006.01);
U.S. Cl.
CPC ...
Abstract
A focused ion beam system comprises a specimen chamber, a FIB column, a SEM stage, a side entry stage, a TEM specimen holder, a micro-sampling manipulator, and a SEM holder exchanger chamber. The SEM stage comprises an x-table, a y-table, a z-table, a rotation table, and a tilt table for moving a specimen. The side entry stage comprises an x-micromotion driver and a yzt-micromotion driver which are disposed in the specimen chamber to oppose each other. The x-micromotion driver is disposed in a hollow area defined in a tilt shaft provided for the tilt table.