The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 21, 2006

Filed:

Feb. 13, 2004
Applicant:

Miyuki Matsuya, Tokyo, JP;

Inventor:

Miyuki Matsuya, Tokyo, JP;

Assignee:

Jeol Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 3/14 (2006.01);
U.S. Cl.
CPC ...
Abstract

On a charged-particle optical system for achieving optimum aberration correction and obtaining a minimum probe diameter, the optical system focuses a beam of charged particles onto a surface of a specimen, and has four stages of multipole elements arranged along the optical axis of the beam, power supplies capable of supplying five or more independent octopole electric or magnetic potentials, and a control portion for correcting third-order aperture aberrations by adjusting the five or more independent octopole electric or magnetic potentials independently. The power supplies apply normal octopole electric or magnetic potentials to at least three of the four stages of multipole elements independently and apply skew octopole electric or magnetic potentials to at least two of the multipole elements independently.


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