The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 21, 2006
Filed:
Aug. 28, 2001
Applicants:
Fang-cheng Chang, Sunnyvale, CA (US);
Christophe Pierrat, Santa Clara, CA (US);
Inventors:
Fang-Cheng Chang, Sunnyvale, CA (US);
Christophe Pierrat, Santa Clara, CA (US);
Assignee:
Synopsys, Inc., Mountain View, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 (2006.01); G06K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Automated techniques for identifying dummy/main features on a mask layer are provided. In a multiple mask layer technique, the definition of a dummy/main feature can be based on connectivity information or functional association information. In a geometry technique, the definition of a dummy/main feature can be based on a feature size, a feature shape, a pattern of features, or a proximity of a feature to a neighboring feature. In one embodiment, multiple definitions and multiple techniques can be used.