The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 14, 2006
Filed:
Feb. 08, 2001
Applicants:
Yasutaka Ito, Gifu, JP;
Yasuji Hiramatsu, Gifu, JP;
Inventors:
Yasutaka Ito, Gifu, JP;
Yasuji Hiramatsu, Gifu, JP;
Assignee:
Ibiden Co., Ltd., Ogaki, JP;
Primary Examiner:
Int. Cl.
CPC ...
B32B 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
The object of the present invention is to provide a ceramic substrate that can provide a substantially uniform temperature distribution to a surface of the ceramic substrate where a semiconductor wafer is treated. A ceramic substrate for a semiconductor-producing/examining device according to the present invention is a ceramic substrate having a conductor formed on a surface of the ceramic substrate or inside the ceramic substrate, wherein said substrate is containing oxygen and having a disc form, the diameter thereof exceeding 250 mm and a thickness thereof being 25 mm or less.