The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2006
Filed:
May. 17, 2002
Wolfgang Singer, Aalen, DE;
Jörg Schultz, Aalen, DE;
Johannes Wangler, Königsbronn, DE;
Karl-heinz Schuster, Königsbronn, DE;
Udo Dinger, Oberkochen, DE;
Martin Antoni, Aalen, DE;
Joachim Wietzorrek, Aalen, DE;
Joachim Hainz, Aalen, DE;
Wolfgang Singer, Aalen, DE;
Jörg Schultz, Aalen, DE;
Johannes Wangler, Königsbronn, DE;
Karl-Heinz Schuster, Königsbronn, DE;
Udo Dinger, Oberkochen, DE;
Martin Antoni, Aalen, DE;
Joachim Wietzorrek, Aalen, DE;
Joachim Hainz, Aalen, DE;
Carl Zeiss Semiconductor Manufacturing Technologies AG, Oberkochen, DE;
Abstract
There is provided an illumination system for scannertype microlithography along a scanning direction with a light source emitting a wavelength ≦193 nm. The illumination system includes a plurality of raster elements. The plurality of raster elements is imaged into an image plane of the illumination system to produce a plurality of images being partially superimposed on a field in the image plane. The field defines a non-rectangular intensity profile in the scanning direction.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile