The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2006
Filed:
Mar. 31, 2004
Applicants:
Chang-hyun Ko, Seoul, KR;
Ki-hyun Hwang, Gyeonggi-do, KR;
Hyo-jung Kim, Busan-si, KR;
Inventors:
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/22 (2006.01);
U.S. Cl.
CPC ...
Abstract
Methods for forming a thin film on an integrated circuit device including providing energy to reactants in a deposition chamber to activate the reactants. The activated reactants are then deposited on the substrate to form a thin film on the substrate. The reactants selected may be selectively activated so that different thin films are formed in a single chamber thereby reducing processing time.
Quick Actions:
Ko, Chang-Hyun. (2006). Methods for forming a thin film on an integrated circuit device by sequentially providing energies to activate the reactants (U.S. Patent No. 7005389). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7005389
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile