The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2006
Filed:
Jan. 18, 2002
Kevin J. Moeggenborg, Naperville, IL (US);
Isaac K. Cherian, Aurora, IL (US);
Vlasta Brusic, Geneva, IL (US);
Kevin J. Moeggenborg, Naperville, IL (US);
Isaac K. Cherian, Aurora, IL (US);
Vlasta Brusic, Geneva, IL (US);
Cabot Microelectronics Corporation, Aurora, IL (US);
Abstract
The invention provides a chemical-mechanical polishing system and method comprising a liquid carrier, a polishing pad and/or an abrasive, and at least one amine-containing polymer, wherein the amine-containing polymer has about 5 or more sequential atoms separating the nitrogen atoms of the amino functional groups or is a block copolymer with at least one polymer block comprising one or more amine functional groups and at least one polymer block not comprising any amine functional groups.