The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2006
Filed:
Feb. 28, 2005
Ryouichi Yokoyama, Tachikawa, JP;
Kamihisa Endo, Saitama, JP;
Ryouichi Yokoyama, Tachikawa, JP;
Kamihisa Endo, Saitama, JP;
Rigaku Corporation, Tokyo, JP;
Abstract
A stress of a c-axis-oriented specimen of a tetragonal polycrystal is measured using X-ray diffraction under the assumption of a plane stress state. An X-ray optical system is set in the location of φ=0°, 45° or 90°. An X-ray diffracted at a crystal plane (the direction of the normal thereto is the direction of an angle of ψ) with the Miller indices (hkl) is detected. A diffraction angle θ in a strain state is measured in the vicinity of a Bragg's angle θin a non-strain state. Strains ε with respect to a plurality of ψ are calculated from the difference between the measurement values θ and the Bragg's angle θ. Specific stress calculation formulae are determined with respect to the tetragonal system having the Laue symmetry 4/mmm. The stress is calculated from the slope of the linear line of plotted measurement results.