The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 2006
Filed:
May. 25, 2004
Susumu Yamaguchi, Hamura, JP;
Tetsuya Ozawa, Hino, JP;
Katsuhiko Inaba, Ome, JP;
Ryuji Matsuo, Ome, JP;
Susumu Yamaguchi, Hamura, JP;
Tetsuya Ozawa, Hino, JP;
Katsuhiko Inaba, Ome, JP;
Ryuji Matsuo, Ome, JP;
Rigaku Corporation, Akishima, JP;
Abstract
Reciprocal-space mapping measurement of X-ray diffraction requires setting of the measuring range of 2θ/ω and setting of the measuring range of ω. When the measuring range of ω is designated in absolute angle, the absolute-angle-designated range is converted into a relative-angle-designated range to be acquired; preventing setting of a warped measuring region. When the measuring range of ω is designated in relative angle, it is acquired as it is. For the measuring range of 2θ/ω, any one of the absolute-angle-designated range and the relative-angle-designated range may be acquired.