The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 14, 2006

Filed:

Nov. 07, 2002
Applicants:

Shih-hao Shih, Hsinchu, TW;

Wei-chen Chen, Hsinchu, TW;

Chi-chen Luo, Hsinchu, TW;

Hsin-cheng Liu, Hsinchu, TW;

Andy Lin, Hsinchu, TW;

Inventors:

Shih-Hao Shih, Hsinchu, TW;

Wei-Chen Chen, Hsinchu, TW;

Chi-Chen Luo, Hsinchu, TW;

Hsin-Cheng Liu, Hsinchu, TW;

Andy Lin, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B65B 1/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

A gas conduit for a load lock chamber. The gas conduit connects to a gas source to introduce gas from the gas source into the load lock chamber of semiconductor equipment. The structure includes a filter mounted on the top surface of the load lock chamber, a pressure limitative device to maintain a preset pressure of gas source, and a gas inlet device including an inlet end connected to the pressure limitative device and an outlet end connected to the filter, wherein the gas inlet device introduces gas from the gas source into the load lock chamber with its maximum flow rate when breaching the vacuum therein.


Find Patent Forward Citations

Loading…