The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 2006
Filed:
Mar. 01, 2002
Takanobu Takeda, Nakakubiki-gun, JP;
Jun Hatakeyama, Nakakubiki-gun, JP;
Toshinobu Ishihara, Nakakubiki-gun, JP;
Tohru Kubota, Nakakubiki-gun, JP;
Yasufumi Kubota, Nakakubiki-gun, JP;
Takanobu Takeda, Nakakubiki-gun, JP;
Jun Hatakeyama, Nakakubiki-gun, JP;
Toshinobu Ishihara, Nakakubiki-gun, JP;
Tohru Kubota, Nakakubiki-gun, JP;
Yasufumi Kubota, Nakakubiki-gun, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
Novel silicon-containing polymers are obtained by copolymerizing a vinylsilane monomer with a compound having a low electron density unsaturated bond such as maleic anhydride, maleimide derivatives or tetrafluoroethylene. Using the polymers, chemical amplification positive resist compositions sensitive to high-energy radiation and having a high sensitivity and resolution at a wavelength of less than 300 nm and improved resistance to oxygen plasma etching are obtained.