The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2006
Filed:
Aug. 10, 2004
Olivier Rayssac, Grenoble, FR;
Beryl Blondeau, La Tronche, FR;
Hubert Moriceau, Saint Egreve, FR;
Christelle Lagahe-blanchard, Saint Joseph la Riviere, FR;
Franck Fournel, Moirans, FR;
Olivier Rayssac, Grenoble, FR;
Beryl Blondeau, La Tronche, FR;
Hubert Moriceau, Saint Egreve, FR;
Christelle Lagahe-Blanchard, Saint Joseph la Riviere, FR;
Franck Fournel, Moirans, FR;
S.O.I.Tec Silicon on Insulation Technologies S.A., Bernin, FR;
Commissariat Ă l'Energie Atomique (CEA), Paris, FR;
Abstract
This invention relates to a process for treatment of a multi-layer wafer with materials having differential thermal characteristics, the process comprising a high temperature heat treatment step that can generate secondary defects, characterised in that this process includes a wafer surface preparation step before the high temperature heat treatment step.