The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2006
Filed:
May. 16, 2003
Munirathna Padmanaban, Bridgewater, NJ (US);
Takanori Kudo, Bedminster, NJ (US);
Sangho Lee, Bridgewater, NJ (US);
Ralph R. Dammel, Flemington, NJ (US);
M. Dalil Rahman, Flemington, NJ (US);
Munirathna Padmanaban, Bridgewater, NJ (US);
Takanori Kudo, Bedminster, NJ (US);
Sangho Lee, Bridgewater, NJ (US);
Ralph R. Dammel, Flemington, NJ (US);
M. Dalil Rahman, Flemington, NJ (US);
AZ Electronic Materials USA Corp., Souerville, NJ (US);
Abstract
The present invention relates to a novel photoresist composition that can be developed with an aqueous alkaline solution, and is capable of being imaged at exposure wavelengths in the deep ultraviolet. The invention also relates to a process for imaging the novel photoresist as well as novel photoacid generators. The novel photoresist comprises a) a polymer containing an acid labile group, and b) a novel mixture of photoactive compounds, where the mixture comprises a lower absorbing compound selected from structure 1 and 2, and a higher absorbing compound selected from structure 4 and 5,